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The Dutch semiconductor-equipment maker is working with TSMC to transition to a larger-format photomask, a high-precision master template or stencil that contains the circuit pattern for an integrated circuit. The companies expect the shift to 12-inch masks from 6-inch masks to increase productivity and lower chip-making costs. 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According...","market":"fut","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":{"source":"tipranks_highlight","url":"https://www.tipranks.com/news/blurbs/asml-holding-nv-0qb8-receives-a-buy-from-morgan-stanley-blurbs-news-2?utm_source=itigerup.com&utm_medium=referral","rn_cache_url":null,"directOrigin":true},"property":[],"language":"en","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.tipranks.com/news/blurbs/asml-holding-nv-0qb8-receives-a-buy-from-morgan-stanley-blurbs-news-2?utm_source=itigerup.com&utm_medium=referral","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":"tipranks_highlight","symbols":["BK4543","LU0823434583.USD","DBEU","EPAI","CGIC","IFLR","LU0084288322.USD","DBEF","LU1734074674.USD","GSID","LU0097036916.USD","03165","IE0004445239.USD","ASMZ","EFA","FENI","LU0823434740.USD","LU2063271972.USD","HBMX","LU2543165471.USD","BK4588","LU0345774631.USD","PQNT","ASML","ASMU","ASMH","LU0345774391.USD","BK4585","CHPX","FFGX","ILOW","ASMG","IEFA","BK4147","IE00BD6J9T35.USD"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2665332336","title":"Taiwan Semiconductor Manufacturing, ASML Collaborating on Move to Larger Chipmaking Masks","url":"https://stock-news.laohu8.com/highlight/detail?id=2665332336","media":"MT Newswires Live","labels":["corporation"],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2665332336?lang=en_us&edition=fundamental","pubTime":"2026-09-08 15:56","pubTimestamp":1788854170,"startTime":"0","endTime":"0","summary":"Taiwan Semiconductor Manufacturing  and ASML  are collaborating on a project to move chipmaking to larger numerical aperture extreme ultraviolet masks, the companies said Tuesday.The two chipmakers want to move to 12-inch photomasks following the use of six-inch masks, with the aim of having a pilot production line ready by 2031 and full production by 2033, the companies said.Other players and suppliers appear interested in joining in the effort, the companies 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